Interfacial reaction and formation mechanism of epitaxial CoSi2 by rapid thermal annealing in Co/Ti/Si (100) system 1997
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Year of publication
2010년 이전
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Author
G.B.Kim, J.S.Kwak, H.K.Baik, S.-M.Lee
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Journal
J. Appl. Phys.
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Volume
82
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Page
2323-2328