Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas 2002

• Year of publication

  2010년 이전

• Author

  C.H.Jeong, D.W.Kim, J.W.Bae, Y.J.Sung, J.S.Kwak, Y.J.Park, G.Y.Yeom

• Journal

  Mater. Sci. Eng.

• Volume

  B93

• Page

  60-63