Effect of Ti-capping thickness on the formation of an oxide-interlayer-mediated-epitaxial CoSi2 film by ex-situ annealing 1999

• Year of publication

  2010년 이전

• Author

  G.B.Kim, J.S.Kwak, H.K.Baik, S.-M.Lee

• Journal

  J. Appl. Phys.

• Volume

  85

• Page

  1503-1507