• Information & Opto-Energy Materials (IOEM) Laboratory
  • Kentech 정보·광에너지 소재 연구실

Journal
The effectiveness of a thin refractory metal layer inserted into a Ta film by ion-assisted deposition as a diffusion barrier between copper and silicon 1999
  • Year of publication

    2010년 이전

  • Author

    J.-H.Kim, S.-M.Lee, J.S.Kwak, H.K.Baik, H.J.Ryu, J.H.Je

  • Journal

    J. Korean Physical Society

  • Volume

    35

  • Page

    S349-S352

.