Effects of CeO2 incorporation on the performance of a Ta diffusion barrier for Al metallization 1999

• Year of publication

  2010년 이전

• Author

  J.Kim, J.S.Kwak, D.-S.Yoon, H.K.Baik, S.-M.Lee

• Journal

  J. Appl. Phys.

• Volume

  85

• Page

  2170-2174