• Information & Opto-Energy Materials (IOEM) Laboratory
  • Kentech 정보·광에너지 소재 연구실

Journal
Development of Chip Shrink Technology for Lateral-Type GaN based HFETs Using SiO2/Polyimide Dual IMD Layers 2015
  • Year of publication

    2015

  • Author

    S. K Oh, H.-Y. Ko, T. Jang, and J. S. Kwak

  • Journal

    Electronic Materials Letters

  • Volume

    11(2)

  • Page

    213-216

.